A new solid-state laser generates 193-nm light for precision chipmaking and is the first to produce vortex beams with orbital angular momentum, potentially revolutionizing quantum technology and manufacturing.

Deep ultraviolet (DUV) lasers, which emit high-energy light at extremely short wavelengths, are crucial for semiconductor fabrication, high-resolution spectroscopy, precision material processing, and quantum applications. Unlike conventional excimer or gas discharge lasers, DUV lasers provide superior coherence and lower power consumption, enabling the development of more compact and efficient systems.

Figure 1. Compact Deep Ultraviolet Solid-State Laser Generates 193-nm Vortex Beam

Advancement in Solid-State Laser Technology

In a recent study published in Advanced Photonics Nexus, researchers from the Chinese Academy of Sciences unveiled a major breakthrough: a compact solid-state laser capable of generating coherent light at 193 nanometers. This wavelength is crucial for photolithography, the technique used to etch intricate patterns onto silicon wafers, a fundamental step in manufacturing modern electronic devices. Figure 1 shows Compact Deep Ultraviolet Solid-State Laser Generates 193-nm Vortex Beam.

Mechanism of the 193-nm Laser System

The new laser system operates at a 6 kHz repetition rate and utilizes a custom Yb:YAG crystal amplifier to generate a 1030-nm base laser. This laser is split into two paths: one undergoes fourth-harmonic generation to produce a 258-nm beam with 1.2 watts of output power, while the other drives an optical parametric amplifier to create a 1553-nm beam with 700 milliwatts of power. These beams are then combined using cascaded lithium triborate (LBO) crystals to generate 193-nm light, achieving an average output of 70 milliwatts with a narrow linewidth under 880 MHz.

Pioneering 193-nm Vortex Beam

The researchers incorporated a spiral phase plate into the 1553-nm beam before frequency mixing, successfully generating a vortex beam with orbital angular momentum. This achievement marks the first-ever production of a 193-nm vortex beam from a solid-state laser. Such beams have potential applications in seeding hybrid ArF excimer lasers, wafer processing, defect inspection, quantum communication, and optical micromanipulation.

Future Prospects and Impact

This cutting-edge laser system improves the efficiency and precision of semiconductor lithography while unlocking new possibilities for advanced manufacturing [1]. The capability to generate a 193-nm vortex beam could drive further innovations, potentially transforming electronic device production.

References:

1. https://scitechdaily.com/scientists-create-compact-laser-that-could-revolutionize-chipmaking-and-quantum-devices/

Cite this article:

Janani R (2025), Researchers Develop Miniature Laser with Potential to Transform Chipmaking and Quantum Technology, AnaTechMaz, pp.234